Vacuum-Compatible Platform

In-chamber ultrasonic spray deposition that doesn't disturb your vacuum — purely acoustic atomization with no air or carrier gas, operating down to roughly millitorr pressures.

Vacuum-Compatible Platform
CF flange assembly for mounting MicroSpray nozzles through the chamber wall

MicroSpray nozzles atomize acoustically: high-frequency piezoelectric energy generates a capillary wavelet at the nozzle tip that breaks liquid into uniform fine droplets — no air, no carrier gas, no pressure differential. That makes them uniquely suited to vacuum work. The nozzle mounts through the chamber wall on a KF or CF flange and sprays directly inside the chamber without disturbing process vacuum, at operating pressures down to roughly the millitorr range. A proprietary flow-restriction device, designed specifically for vacuum conditions, keeps liquid delivery controlled under low pressure, and integrated temperature management ports keep the nozzle within its working range in hot or cold environments. The result is a practical liquid-precursor delivery platform for PVD, MOCVD, spray pyrolysis, and other controlled-atmosphere thin-film processes.

No Air, No Carrier Gas

Atomization is driven entirely by acoustic energy at the nozzle tip, so spraying adds no gas load to the chamber. Process vacuum stays undisturbed — with typical operation down to roughly millitorr pressures, suitable for PVD and MOCVD processes.

Vacuum Flange Mounting

Systems come equipped with KF or CF flanges for mounting directly into chamber walls, plus an optional threaded front shroud. The nozzle body seals at the flange while the atomizing tip sprays inside the chamber.

Controlled Liquid Delivery

A proprietary flow-restriction device, designed specifically for vacuum conditions, controls liquid delivery under low pressure — so flow rate stays stable even when the chamber side of the nozzle sits at millitorr while the feed side is at atmosphere.

Built for Controlled-Atmosphere Processes

Spray Pyrolysis

Liquid precursor delivery onto heated substrates for oxide films, TCO layers, and nanoparticle synthesis in controlled atmospheres.

PVD & MOCVD

Precursor introduction at millitorr operating pressures without adding gas load or disturbing chamber vacuum.

Extreme-Temperature Environments

Cooling/heating ports support environments above ~150°C or below −20°C, with thermocouple ports for monitoring internal nozzle temperature.

Where It's Used

SemiconductorsPhotovoltaics & solarAdvanced materials researchOptical coatingsEnergy storageUniversity & national laboratories

Specifications

AtomizationPurely acoustic — no air or carrier gas
Operating pressureVacuum service down to roughly the millitorr range
Chamber mountingKF or CF flange, plus optional threaded front shroud
Liquid deliveryProprietary flow-restriction device for low-pressure flow control
Temperature managementCooling/heating ports for environments above ~150°C or below −20°C
Temperature monitoringThermocouple ports for internal nozzle temperature
Wetted materialsTitanium, stainless steel, PTFE

Flange type, shroud, and temperature-management configuration are matched to your chamber and process — confirm details with our engineers.

Recommended Nozzles

ThermalSpray™ High-Temperature Ultrasonic Nozzle

Thermal isolation design built for spray pyrolysis and heated-chamber deposition up to 300°C

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Zero Air Nozzle

The core air-free ultrasonic nozzle — precise thin-film delivery with virtually zero flow rate

View details →

Discuss Your Vacuum Process

Let's discuss whether the Vacuum-Compatible Platform fits your process.

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