Ultrasonic Spray-CVD: A Versatile Route to Thin-Film Devices
January 1, 2015
Pulsed ultrasonic nozzles in direct-injection CVD for polymer, metal-organic, and ceramic films across MEMS, OLEDs, and SAW sensors.
Cite: Chemical Vapor Deposition by Pulsed Ultrasonic Direct Injection of Liquid Precursors Produces Versatile Method for Creation of Thin Film Circuits and Devices. MRS Online Proceedings Library, Cambridge University Press.
Direct-Injection CVD with Pulsed Ultrasonic Nozzles
Pulsed ultrasonic nozzles in a direct-injection CVD system enable precise deposition of polymer, metal-organic, and ceramic thin films. This adaptable technique delivers controlled morphology for applications ranging from MEMS and OLEDs to conformal coatings and SAW sensors, all within a single modular platform.
Reference
"Chemical Vapor Deposition by Pulsed Ultrasonic Direct Injection of Liquid Precursors Produces Versatile Method for Creation of Thin Film Circuits and Devices" — published by Cambridge University Press.